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Dr. YuanQiao Rao (PhD '95)

Thin Film Technology and Product Development
The Dow Chemical Company

Copolymers of Silsesquioxane and Silica as Antireflective Hardmark Materials in Advanced Lithography

Hosted by: Alan Lesser 

Date: 

Sep 18, 2015 - 3:35 PM

Location: 

Conte A110/111