Thin Film Technology and Product Development
The Dow Chemical Company
Copolymers of Silsesquioxane and Silica as Antireflective Hardmark Materials in Advanced Lithography
Hosted by: Alan Lesser
Date:
Sep 18, 2015 - 3:35 PM
Location:
Conte A110/111
- Dissertation Defense (284)
- Seminars (334)
- Special Event (29)
Dr. YuanQiao Rao (PhD '95)