Shiva Asapu, James Nicolas Pagaduan,* Ye Zhuo, Taehwan Moon, Rivu Midya, Dawei Gao, Jungmin Lee, Qing Wu, Mark Barnell, Sabyasachi Ganguli, Reika Katsumata,* Yong Chen, Qiangfei Xia, and Jianhua Joshua Yang have published a paper in Frontiers in Materials. In this work, researchers examined the impact of rapid thermal annealing temperature on the ferroelectric polarization in zirconium-doped hafnium oxide capacitors for potential neuromorphic computing applications.